Savannah S200 ALD system supports thin film growth one layer at a time for 10s of nanometers at optimal scale. There are two modes of operation: Exposure Mode™, which allows conformal film growth at ultra‐high aspect ratio (i.e. > 2000:1) such as those found in porous foams, fibers, and nanogels; Continuous Mode™, which creates rapid growth of perfectly dense, uniform and conformal films. The unit is set up for aluminum oxide, titanium oxide, hafnium oxide, and zirconium oxide processes.
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