The Glovebox/Thin Film Deposition System allows deposition of organic and metallic materials sensitive to oxygen and/or water by thermal evaporation or by solution-process using a spin-coater. Deposition procedure is carried out under inert atmosphere (i.e. N2). Some restrictions on equipment use applies, contact the faculty in charge of this instrument (see "Instrument User Policy and Instrument List") for additional information.
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Click the link below to go to the equipment reservation page.