The NVision 40 can accommodate 2 specimens through the side air lock and 6 specimens through the main chamber for SEM magnification ranging from 30x - 900kx with resolutions of 1.1 nm @ 20kV and 2.5 nm @ 1kV. This is a used system and the actual resolution that can be obtained is around 10-20 nm. Detectors in place are EsB and BSE (in-column), SE (in-lens), and Everhart Thornley type SE detector (chamber). NVision 40 also has a NanoPattern Generating System (NPGS) which is capable of nanoscale E-beam Lithography. Applications include nanometer scale patterning and etching, as well as imaging.
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